Recovery stress of TiNi shape memory alloy. (Cyclic characteristics under constant residual strain).
نویسندگان
چکیده
منابع مشابه
Residual Stress of TiNi Shape Memory Alloy Thin Films with (111) Single-crystal Silicon Wafer
As micro-actuator materials, TiNi shape memory alloy thin films with substrate are used more and more in MEMS field. The residual stress in Ti-rich TiNi thin films with silicon substrate prepared by the magnetron-sputtering technique is measured by both X-ray glancing and contour method. The influence of crystallization annealing temperature and film thickness on the residual stress is tested. ...
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The transformation-induced stress relaxation and stress recovery of TiNi shape memory alloy (SMA) in stress-controlled subloop loading were investigated based on the local variation in temperature and transformation band on the surface of the tape in the tension test. The results obtained are summarized as follows. (1) In the loading process, temperature increases due to the exothermic martensi...
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ژورنال
عنوان ژورنال: TRANSACTIONS OF THE JAPAN SOCIETY OF MECHANICAL ENGINEERS Series A
سال: 1991
ISSN: 0387-5008,1884-8338
DOI: 10.1299/kikaia.57.115